发明名称 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR
摘要 PROBLEM TO BE SOLVED: To improve high-frequency characteristics of a lateral bipolar transistor. SOLUTION: In a manufacturing method of a bipolar transistor, in which an emitter region, a base region, a collector region are arranged in the crosswise direction on a semiconductor layer formed on an insulating film, an extracting electrode for applying the potential that in the past could not be applied to the base region is formed self-consistently, and the bipolar transistor with good controllability can be formed without increasing parasitic resistance by parasitic capacity.
申请公布号 JP2001185556(A) 申请公布日期 2001.07.06
申请号 JP19990364197 申请日期 1999.12.22
申请人 TOSHIBA CORP 发明人 KAWANAKA SHIGERU;ARAI HIDEAKI
分类号 H01L29/73;H01L21/331;(IPC1-7):H01L21/331 主分类号 H01L29/73
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