发明名称 |
EXPORSURE PROJECTION EQUIPMENT |
摘要 |
PURPOSE: To provide equipment that controls a pattern without taking a spatial frequency filter out of a projection lens system. CONSTITUTION: In a projection lens system 10 a spatial frequency filter 103 is arranged on the pupil aperture. The equipment includes a liquid crystal element controller 15b and a filter information storage part 16b as means to control the spatial frequency filter 103. Patterns required for the spatial frequency filter 103 are transferred from the filter information storage part 16b to the liquid crystal element controller 15b. The transmittance and the phase difference of the spatial frequency filter 103, are simulated in advance at the design phase, and the modes of application of voltage to the liquid crystal element are determined based on these data and they are stared in the filter information storage part 16b.
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申请公布号 |
KR20010060173(A) |
申请公布日期 |
2001.07.06 |
申请号 |
KR20000061520 |
申请日期 |
2000.10.19 |
申请人 |
MITSUBISHI DENKI KABUSHIKI KAISHA |
发明人 |
TSUKUDA EIJI |
分类号 |
H01L21/027;G02B27/46;G02F1/13;G02F1/1347;G03F7/20;(IPC1-7):G02F1/13 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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