| 摘要 |
PURPOSE: A composite system for manufacturing a semiconductor device is provided to reduce the creation of a natural oxide layer by performing a cleaning process and a deposition process in one system. CONSTITUTION: A composite system for manufacturing a semiconductor device comprises a cleaning robot(30) which is movably installed in a working chamber. A plurality of chemical bathes(31) are installed at a side of the cleaning robot(30). The plural chemical bathes(31) are vertically stacked so as to inject chemical. A plurality of cassette supplying devices(32) are installed at a side of the chemical bath(31). The cassette supplying devices(32) are formed with a plurality of gates and a rotating device for rotating a cassette and the wafer. A deposition robot(33) is positioned at a side of the chemical bath(31) and the cassette supplying device(32). A plurality of reaction furnaces(34) are formed at a side of the deposition robot(33).
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