发明名称 TRANSFORMATION ILLUMINATING SYSTEM FOR MANUFACTURING WAFERS
摘要 PURPOSE: A transformation illuminating system is provided to improve the contrast of light and the resolution of the light, by obviating the interference between lights degrading the contrast when the lights diffracted through a mask is overlapped. CONSTITUTION: A transformation illuminating system includes a light source(51). An aperture(53) selectively transmits the light from the light source(51) through a plurality of poles. A reflection mirror(57) reflects the light through the aperture(53) toward a mask(59). A focusing lens(61) focuses only the lights passed through the mask(59) to illuminate them toward a wafer(W). The aperture(53) is formed to allow the lights passed through the poles to have different phases.
申请公布号 KR20010060121(A) 申请公布日期 2001.07.06
申请号 KR19990068243 申请日期 1999.12.31
申请人 HYNIX SEMICONDUCTOR INC. 发明人 PARK, JONG O
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
代理机构 代理人
主权项
地址