| 摘要 |
PURPOSE: To provide a low-cost plasma processor which can process the large area of a substrate with an even plasma, and can prevent the damages caused by abnormal plasma. CONSTITUTION: This plasma processor has a dielectric plate 5 for emitting plasma into a chamber, and a dielectric plate support member 6 for the dielectric plate 5. The dielectric plate support member 6 is provided with a plurality of gas introduction ports 6a for supplying the interior of a chamber with reaction gas. The blowout ports of these gas introduction ports 6a are provided on the side opposed to the surface of a board 8, and besides they are arranged in the positions surrounding the periphery, in the peripheral region of the dielectric plate 5.
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