| 摘要 |
PROBLEM TO BE SOLVED: To provide a photoacid producing agent for a chemically amplified resist such that the acid produced by irradiation of light is a strong acid and that the photoacid producing agent and the produced acid have excellent compat ibility with a resist resin. SOLUTION: The photoacid producing agent contains a borate having a structure of X+ (cation) Y- (anion). The anionic borate ion expressed by Y4- has a structure expressed by general formula of [BR1mR24-m]-, wherein R1 is an aryl group having an electron withdrawing group, R2 is an organic group, halogen group or hydroxyl group and m is an integer 1 to 4. The cation expressed by X+ has a structure expressed by general formula of [(R3)xM]+, wherein R3 is an organic group, M is an element selected from elements in the groups Vb, VIb, VIIb, IIIa, IVa, Va, VIa, VIIa and VIII in the periodical table, x=y+1 and y is the valence of M. |
