| 摘要 |
PURPOSE: An automatic flow rate control apparatus is provided to prevent generation of irregular development by allowing a developing solution flowing into a developing solution supply line to be always supplied with a constant amount. CONSTITUTION: An automatic flow rate control apparatus includes a rotation axis(12) in a motor(11a) of a motor(11). A wafer chuck(13) for fixing a wafer(W) is installed on the rotation axis(12). A nozzle(15) for spraying a developing solution(14) on the top of the wafer(W) is installed on the wafer chuck(13). A developing solution supply line(16) is connected to the nozzle(15). An air filter(17), a filter(18) and a flowmeter(19) are installed on the developing solution supply line(16). A flow rate controller(20) for automatically controlling the amount of the developing solution(14) to the developing solution supply line(16) is installed at the rear of the flowmeter(19).
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