发明名称 MASK PATTERN MEASURING METHOD
摘要 PROBLEM TO BE SOLVED: To speedily and accurately measure shape characteristic values, representing features of the mask pattern shape of a phoromak, from the profile of the pattern. SOLUTION: A mask pattern image 1 for measuring a pattern shape is read in a computer, profile data 3 are generated through an image process 2 and then scanned to perform conversion into vector data 5, and a connecting and composing process 6 is further carried out to perform conversion into line drawing data 7; and a coordinate measuring process 8 is carried out for the line drawing data, so that shape characteristic values 9 can be measured.
申请公布号 JP2001183116(A) 申请公布日期 2001.07.06
申请号 JP19990367669 申请日期 1999.12.24
申请人 TOPPAN PRINTING CO LTD 发明人 YONEKURA ISAO;FUKUSHIMA YUICHI
分类号 G01B11/24;G03F1/84;G06T1/00;G06T7/00;H01L21/027 主分类号 G01B11/24
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