MASK CAPABLE OF EFFICIENTLY COMPENSATING ALIGNMENT ERROR OF EXPOSING EQUIPMENT, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THEREOF

摘要

PURPOSE: A mask capable of efficiently compensating an alignment error and a method for manufacturing a semiconductor device using the same are to measure a field size and a registration(overlay accuracy) which are a basic unit of an exposure, thereby obtaining an x and y-axis shot magnify error and an asymmetric magnify error. CONSTITUTION: The mask comprises a vernier for measuring a registration on a scribe lane(42) around a die(41). A daughter vernier(S1) and a reference vernier(c) having a registration error of zero are arranged on a left scribe lane(the first scribe lane) and a lower scribe lane(the second scribe lane), respectively. A mother vernier(M1) is arranged on a right scribe lane(the third scribe lane) and an upper scribe lane(the fourth scribe lane). The first pattern is formed on a substrate using the first mask having the daughter vernier, the mother vernier, and the reference vernier on the first scribe lane.