LASER ANNEAL METHOD AND DEVICE

摘要

PROBLEM TO BE SOLVED: To uniformly conduct a recrystallization of a silicon thin film, etc. SOLUTION: A laser annealing device comprises a plurality of laser oscillators 1, 2, 3; and a controller 4 for controlling operations of the plurality of laser oscillators, and the controller 4 selects any one of the plurality of laser oscillators and operates sequentially them to irradiate laser beams on a predetermined region.