发明名称 ELECTRON BEAM DEVICE
摘要 PROBLEM TO BE SOLVED: To observe a semiconductor wafer in a high resolution using a low acceleration voltage, in particular enable to observe a vafer at the time of a large angle of inclination in a high resolution. SOLUTION: This device is a complex lens having a single pole magnetic field type lens 4 and an electrostatic lens 3, and electrode of tbe electrostatic lens 3 opposing to a wafer is made from a magnetic material, and a negative high voltage is applied to the electrode and the wafer. In the case the wafer is inclined, a failure of focal point/axis is not generated.
申请公布号 JP2001185066(A) 申请公布日期 2001.07.06
申请号 JP19990367441 申请日期 1999.12.24
申请人 SEIKO INSTRUMENTS INC 发明人 YONEZAWA AKIRA;MORITA SEIJI;SATO MITSUYOSHI
分类号 H01J37/145;G01Q60/00;H01J37/141;H01J37/244;H01J37/28;(IPC1-7):H01J37/145 主分类号 H01J37/145
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