发明名称 |
Surface treatment apparatus |
摘要 |
The present invention provides a surface treatment apparatus which can treat a surface with high speed and high quality. A casing of a surface treatment apparatus is defined into two chambers, a plasma generation chamber provided with a plasma generation electrode and a substrate treatment chamber provided with a substrate support table. A plasma nozzle is formed on an anode electrode constituting a partition wall of the both chambers. A recess is formed on an upper cathode electrode. Further, the plasma nozzle is used as a hollow anode discharge generation area, and the recess as a hollow cathode discharge generation area.
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申请公布号 |
US2001006093(A1) |
申请公布日期 |
2001.07.05 |
申请号 |
US20000730813 |
申请日期 |
2000.12.06 |
申请人 |
TABUCHI TOSHIHIRO;ISHIDA KOUICHI;MIZUKAMI HIROYUKI;TAKASHIRI MASAYUKI |
发明人 |
TABUCHI TOSHIHIRO;ISHIDA KOUICHI;MIZUKAMI HIROYUKI;TAKASHIRI MASAYUKI |
分类号 |
C23C16/24;C23C16/452;C23C16/505;H01J37/32;(IPC1-7):C23C16/503 |
主分类号 |
C23C16/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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