发明名称 Methods and apparatuses for substrate transporting, positioning, holding, and exposure processing, device manufacturing method and device
摘要 Provided in the present invention are methods and apparatuses for transporting a substrate plate efficiently, for positioning the substrate plate to enable to minimize mechanical motions and generation of vibration associated with conventional substrate positioning, and for holding the substrate. For example, the present exposure apparatus has a plurality of electrodes arranged along the baseplate and a transport apparatus having a control apparatus to impress a voltage on each electrode to first generate static charges in the substrate plate, then to impress a voltage on each of the plurality of electrodes so that the charge code of the electrodes is the same as the charge code of the substrate plate, and to switch the voltage on the electrodes in accordance with the time interval required to produce dielectric polarization in the substrate plate. The substrate plate can be transported by electrostatic forces at high speed without contacting the baseplate.
申请公布号 US2001006763(A1) 申请公布日期 2001.07.05
申请号 US20000745432 申请日期 2000.12.26
申请人 NIKON CORPORATION 发明人 TANAKA KEIICHI
分类号 B65G49/06;B65G49/07;G03F7/20;G03F9/00;H01L21/027;H01L21/677;H01L21/68;(IPC1-7):G03F7/20 主分类号 B65G49/06
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