发明名称 STRESS ISOLATED INTEGRATED CIRCUIT AND MANUFACTURING METHOD THEREOF
摘要 A stress-isolated integrated circuit includes a semiconductor die (24) having first and second surfaces (28, 32) and a semi-circumferential trench (44) formed into the first surface of the die todefine a stress-isolated region (48). At least some of the active IC components are located in the stress-isolated region. A cavity (46) is formed into the second surface of the die, the cavity being sized so that the trench opens into the cavity to create a cantilevered stress-isolated region extending from the remainder of the die. The second surface of the die is secured to a lead frame (36), the lead frame having bond wires (42) secured to bond pads (26) on the die. A molding compound (54) encapsulates the die, the cap, the bond wires and a portion of the lead frame to create a molded IC device (20). The invention helps to improve performance characteristics and component variables of analog and mixed-signal integrated circuits by isolating critical portions of the integrated circuits from detrimental packaging and molding stresses.
申请公布号 WO0148815(A1) 申请公布日期 2001.07.05
申请号 WO2000US35592 申请日期 2000.12.27
申请人 MAXIM INTEGRATED PRODUCTS, INC. 发明人 BURNS, DAVID, W.;BRYZEK, JANUSZ
分类号 H01L21/764;H01L23/10;H01L23/16 主分类号 H01L21/764
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