DEVICE FOR EVALUATION OF MASK PATTERN SHAPE, METHOD OF EVALUATING SHAPE AND RECORDING MEDIUM IN WHICH PROGRAM FOR EVALUATION OF SHAPE IS RECORDED

摘要

PROBLEM TO BE SOLVED: To provide a device and method for the exact evaluation of the shape of a mask pattern with high accuracy by using a new evaluation means relating to the evaluation of the pattern shape of a photomask containing a fine pattern. SOLUTION: After the image of a mask pattern is inputted and processed by using a computer to extract the data of the outline of the pattern, a specified pattern is encoded into vectors and the shape characteristics of the specified pattern are judged and processed to calculate a specified shape characteristic value to evaluate the pattern shape.