LONG PERSISTENT PHOSPHOR INCORPORATED WITHIN A NON-SETTABLE MATERIAL

摘要

A process for incorporating a long persistent phosphor within a non-settable material includes firing a doped phosphor to obtain a phosphor having a persistence that ranges from minutes to hours. The fired phosphor is then ground into a phosphor particulate having a mean domain size. Typical particulate mean domain size ranges from 1 to 60 microns. The phosphor particulate is thereafter encapsulated within a water impervious coating material such as silicon oxide or fluoride. The coated phosphor particulate is then mixed in a specified volume ratio within the non-settable material. Typical formulation ratios range from 0.1 to 30 volume percent of particulat e.