Apparatus for cathodic sputtering used in the production of layers on a substrate in a vacuum chamber has screening elements in the region of the sputtering cathode, the yoke, pole piece and/or the substrate to be coated

摘要

Apparatus for cathodic sputtering has screening elements (6-6'''') in the region of the sputtering cathode (2,8), the yoke (5), pole piece (3) and/or the substrate (4) to be coated. Preferred Features: The screening elements are made of a ferromagnetic material and are arranged concentrically to the central axis of the sputtering cathode.