发明名称 Interferometric alignment system for use in vacuum-based lithographic apparatus
摘要 In a lithographic apparatus having a movable object table in vacuum, an interferometer-based alignment system for detecting the position of that object table has a passive part in vacuum and an active part outside the vacuum chamber. The active part contains the beam generator, e.g. a laser, and the electronic detectors whilst the passive part contains the illumination and imaging optics. The two parts are coupled by optical fibers. The interferometer may make use of different diffraction orders from measurement and reference gratings and the order separation may be included in the passive part.
申请公布号 US2001006413(A1) 申请公布日期 2001.07.05
申请号 US20000741009 申请日期 2000.12.21
申请人 BURGHOORN JACOBUS 发明人 BURGHOORN JACOBUS
分类号 G01B11/00;G03F9/00;H01L21/027;(IPC1-7):G03B27/42 主分类号 G01B11/00
代理机构 代理人
主权项
地址