发明名称 RESILIENT INTERCONNECT STRUCTURE FOR ELECTRONIC COMPONENTS AND METHOD FOR MAKING THE SAME
摘要 <p>An interconnection element of a spring (body), and a method for fabricating the interconnection element. The interconnection element is of a size suitable for directly contacting a semiconductor or a packaged semiconductor device such as in an LGA package. The method includes fabricating a multi-tiered structure to form a compact, resilient interconnect structure. Fabricating each tier or leaf includes providing a base substrate material, and applying a masking material over the base substrate material. An opening is patterned in the masking material and a resilient element is formed in the opening. A large substrate with a plurality of such interconnection elements can be used as a wafer-level contactor. The method includes repeating this process one or more times to fabricate a chip-level interconnection element.</p>
申请公布号 WO2001048818(A1) 申请公布日期 2001.07.05
申请号 US2000035448 申请日期 2000.12.27
申请人 发明人
分类号 主分类号
代理机构 代理人
主权项
地址