发明名称 Apparatus for cathodic sputtering used in production of layers on substrate in vacuum chamber has components made of non-magnetic material arranged outside of apparatus, sputtering cathode, yoke, pole piece and substrate to be coated
摘要 Apparatus for cathodic sputtering has components made of non-magnetic material arranged outside of the apparatus, sputtering cathode (2), yoke (5), pole piece (3) and substrate (4) to be coated. Preferred Features: The non-magnetic material is made of Cr, Ni, Mo and/or brass. All ferromagnetic components are arranged concentrically to the sputtering cathode.
申请公布号 DE19962890(A1) 申请公布日期 2001.07.05
申请号 DE19991062890 申请日期 1999.12.24
申请人 MULTI MEDIA MACHINERY GMBH 发明人 FRITSCHE, WOLF;JUNG, MICHAEL
分类号 C23C14/35;H01J37/34;(IPC1-7):C23C14/34 主分类号 C23C14/35
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