| 摘要 |
PURPOSE: A spinner apparatus used for a fabrication of a semiconductor device is provided to prevent a poor coating or waste of photoresist due to insufficiently or excessively dispensed photoresist by monitoring the amount of photoresist dispensed during a dummy dispense process. CONSTITUTION: In the spinner apparatus(10), after applying photoresist to a wafer mounted on a chuck(14) equipped in a catch cup(12), a dispensing nozzle(18) moves over a solvent bath(20) to perform the dummy dispense process. Dummy photoresist(50) dispensed through the dispensing nozzle(18) is stored in a drain line(22) connected to the solvent bath(20) while the first cut-off valve(24) is closed. The dummy photoresist(50) filled in the drain line(22) is detected by the first and second sensors(32,34). No detection of the first sensor(32) means an insufficient dispensing of the dummy photoresist(50), while detection of the second sensor(34) does an excessive dispensing. After monitoring the amount of the dummy photoresist(50), the first cut-off valve(24) is opened to discharge the dummy photoresist(50) from the drain line(22) to a drain tank(25). In addition, the second cut-off valve(28) is opened to supply thinner from a solvent supply line(26) to the drain line(22) for cleaning of the drain line(22).
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