| 摘要 |
PURPOSE: An interval adjusting device of a vertical exposure system is provided which rapidly and softly aligns reciprocal position of a mask and a base plate and improves reliability of a pattern forming process. CONSTITUTION: The device comprises: (i) a mask holder(61) which vertically fixes the pattern formed mask(M); (ii) a mask position adjusting means(60) which supports the mask holder and adjusts its position; (iii) a base plate holder(71) which is vertically positioned in the chamber to be opposite to the mask holder and fixes the base plate(P) to form the pattern thereon; (iv) a base plate position adjusting means(70) which is installed on the inside of the chamber to support the base plate holder and primarily control the intervals between the base plate holder and the mask; and (v) a second interval adjusting means which is installed on the front side of the base plate adjusting means to finely control the interval between the mask and the base plate. |
