| 发明名称 |
Photosensitive polymer and resist composition having cyclic backbone |
| 摘要 |
A photosensitive polymer of the formula below, having a weight-average molecular weight of 3 000 - 100 000, wherein R<SB>1</SB> is hydrogen or methyl, R<SB>2</SB> is an acid-labile tertiary alkyl group, and m/(m+n) is 0.5-0.8. R<SB>2</SB> is preferably an alicyclic, norbornyl or adamantyl group. Also disclosed is a resist composition comprising such a polymer and a photoacid generator (PAG). <EMI ID=1.1 HE=53 WI=86 LX=549 LY=792 TI=CF>
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| 申请公布号 |
GB2357775(A) |
申请公布日期 |
2001.07.04 |
| 申请号 |
GB20000028252 |
申请日期 |
2000.11.20 |
| 申请人 |
* SAMSUNG ELECTRONICS COMPANY LIMITED |
发明人 |
SANG-JUN * CHOI;HYUN-WOO * KIM;SANG-GYUN * WOO;JOO-TAE * MOON |
| 分类号 |
C08F220/18;C08F222/06;C08K5/00;C08L33/06;C08L35/00;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):C08F220/10 |
主分类号 |
C08F220/18 |
| 代理机构 |
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