| 摘要 |
PURPOSE: An exposure apparatus is provided to further exactly and rapidly perform a pre-alignment(PA) process using a driving unit capable of rotating a PA unit. CONSTITUTION: An exposure apparatus includes a pre-alignment(PA) unit(11) for sensing/aligning a flat zone of a wafer. A wafer supply unit(14) supplies the wafer from a wafer carrier(17) to the PA unit(11). A rotation axis(13) connects the PA unit(11) and the wafer supply unit(14). A driving unit(23) drives the rotation axis(13). A control unit(21) controls the driving unit and the wafer supply unit and the PA unit. An exposure unit(18) senses a rotation error of the PA unit(11) by using the wafer from the PA unit(11) and exposes the wafer.
|
