| 摘要 |
PURPOSE: An exposing mask useable in photo lithographic process is provided for enabling the exposure process of chips at edge parts of wafers difficult to expose in one simple field to increase production efficiency by adopting a specific exposing mask provided with window pattern. CONSTITUTION: The exposing mask comprises a first and a second chip areas and a scribe line section between the areas and a window pattern untreated by chromium at any part spaced from the chip areas including the scribe line section. The mask can permit both of the chips and the scribe line adjacent to the chips to be exposed together by only one time of exposing process for a wafer having light-transmission substrate and non light-transmission chromium pattern formed on the substrate and including multi-chips and scribe lines to compartment the chips. The window pattern of the exposing mask has a longitudinal width of 1,000-1,500 micrometers. |
