APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES

摘要

PURPOSE: An apparatus for manufacturing semiconductor devices is provided to be capable of forming an optimum plasma atmosphere and also suitably cleaning every corner of the interior of a reactor using plasma. CONSTITUTION: An apparatus for manufacturing semiconductor devices includes a reactor electrically grounded, for providing a reaction space shielded from the outside. A susceptor(140) is located within the reactor so that it should not be electrically connected to the reactor and functions to seat wafers. A plasma electrode(130) is installed on the outside of the top of the reactor. A RF power supply source(170) is electrically connected to the susceptor and the plasma electrode, respectively, in order to supply RF power. A RF relay(180a) applies selectively or simultaneously the RF power from the RF power supply source to the susceptor or the plasma electrode.