发明名称 SEMICONDUCTOR DEVICE FABRICATION APPARATUS WITH DIRECTLY ATTACHED SLOT VALVE
摘要 PURPOSE: A semiconductor device fabrication apparatus with a directly attached slot valve is provided to prevent undesired particles from being produced in a processing chamber. CONSTITUTION: The apparatus includes the processing chamber(110) in which a susceptor(115) is placed to receive the wafer mounted thereon. The processing chamber(110) has a window for allowing a wafer access to the processing chamber(110). The apparatus further includes the slot valve(134) directly attached to the window of the processing chamber(110). The slot valve(134) opens or blocks a wafer supply route between the processing chamber(110) and a load lock chamber(120). The slot valve(134) has a gate(134b), an insert valve(134a) for opening or shutting the gate(134b), an O-ring(134c) for sealing the processing chamber(110), and a cooling line(134d) for cooling the O-ring(134c). In addition, the operation of the slot valve(134) is controlled by a wafer sensing part(132) formed between the slot valve(134) and the load lock chamber(120). Since the slot valve(134) is directly attached to the processing chamber(110), there is no space admitting deposition of undesired particles.
申请公布号 KR20010056331(A) 申请公布日期 2001.07.04
申请号 KR19990057752 申请日期 1999.12.15
申请人 JU SUNG ENGNEERING CO., LTD. 发明人 HWANG, CHEOL JU;SIM, GYEONG SIK
分类号 H01L21/324;(IPC1-7):H01L21/324 主分类号 H01L21/324
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