MEMBER FOR TREATING SUBSTRATE CONTAMINATED WITH METALLIC SUBSTANCE AT LOW DEGREE

摘要

PROBLEM TO BE SOLVED: To provide a member for treating a substrate contaminated by a metallic substance at a low degree, which is highly corrosion-inhibitive under halogn gas plasma environments and also shows a low degree of contamination with the metallic substance. SOLUTION: This member for treating the substrate s used for a device to treat the substrate by a halogen gas plasma. The region exposed to the halogen gas plasma of the member is composed of Y2O3 having a relative density of 94% or more and a purity of 99.5% or more.