发明名称 BRIGHT TIN-COPPER ALLOY ELECTROPLATING BATH
摘要 PROBLEM TO BE SOLVED: To provide a tin/copper alloy plating bath capable of depositing bright plating film in a current density region in a wide range. SOLUTION: This tin/copper alloy electroplating bath free from cyanide compounds is composed of an aqueous solution for electroplating of tin/tinalloys and is obtained by adding organic sulfonic acid as acid, the bivalent tin salt and bivalent copper salt of organic sulfonic acid as metallic salt and, moreover, a dispersant and a brightener.
申请公布号 JP2001181889(A) 申请公布日期 2001.07.03
申请号 JP19990365405 申请日期 1999.12.22
申请人 NIPPON MACDERMID KK 发明人 TAMURA TAKAAKI
分类号 C25D3/32;C25D3/56;C25D3/58;C25D3/60;(IPC1-7):C25D3/60 主分类号 C25D3/32
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