| 摘要 |
A pellicle includes a reticle, a pellicle frame, a pellicle film, and a capturing material. The pellicle frame has a reticle pattern surface formed with a reticle pattern. The pellicle frame has one end face bonded to the reticle pattern surface to surround the reticle pattern. The pellicle film is bonded to the other end face of the pellicle frame. The capturing material is formed on at least part of an inner surface of the pellicle frame to capture a deposition control material which is present in a gas in a space in the pellicle to control formation of a deposit on the reticle pattern surface. The space in the pellicle is defined by the reticle pattern surface, the pellicle frame, and the pellicle film. A pellicle case for accommodating the pellicle is also disclosed. |
