发明名称 |
Method and device for activating semiconductor impurities |
摘要 |
An impurity doped SiC substrate 1 and SiC thin film 2 are irradiated with a laser light 5 having a wavelength longer than such a wavelength that a band edge absorption of a semiconductor is caused. The wavelength of the laser light 5 may be such a wavelength that an absorption is caused by a vibration by the bond of an impurity element and an element constituting the semiconductor, for example, a wavelength of 9 mum to 11 mum. Specifically, in the case where Al is doped in SiC, the wavelength of the laser light 5 may be within the range of 9.5 mum to 10 mum.
|
申请公布号 |
US6255201(B1) |
申请公布日期 |
2001.07.03 |
申请号 |
US19990341464 |
申请日期 |
1999.07.12 |
申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
YOSHIDA AKIHISA;KITAGAWA MASATOSHI;UCHIDA MASAO;KITABATAKE MAKOTO;MITSUYU TSUNEO |
分类号 |
H01L21/04;H01L29/24;H01L29/861;(IPC1-7):H01L21/42 |
主分类号 |
H01L21/04 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|