发明名称 PLATING METHOD AND PLATING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a plating method and a plating apparatus in which an arbitrarily different plating condition can be made for face and reverse sides of a plate-like work including a printed circuit board, the film thickness ratio can be set to an arbitrary value, and the finish is uniform. SOLUTION: A pair of anodes (not shown in the figure) are disposed at locations facing each other in a plating tank 1, and works 3 and 3 fixed to a hanger jig 2 are disposed therebetween. Work fixing units 16 and 16 to demarcate the plating tank 1 into a face side plating tank 1a and a reverse side plating tank 1b with the plate-like work 3 as a bulkhead are disposed on an inner wall of the plating tank 1, individually controllable current control devices to supply the current for plating are arranged between the face side anode and a hanger jig 2, and between a reverse side anode and the hanger jig 2 to individually control the plating condition in the face side plating tank 1a and the reverse side plating tank 1b.
申请公布号 JP2001181897(A) 申请公布日期 2001.07.03
申请号 JP19990359454 申请日期 1999.12.17
申请人 CHUO SEISAKUSHO LTD 发明人 MIYAZAKI TOSHIHISA;IKUBO KAZUNORI;IGAWA MASAHIRO
分类号 C25D17/00;(IPC1-7):C25D17/00 主分类号 C25D17/00
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