| 摘要 |
PROBLEM TO BE SOLVED: To perform inline measurement of a thin film deposited on a substrate. SOLUTION: The inline measurement of the thickness of a thin film deposited on a substrate S is performed by providing a light source 2 for irradiating a substrate S having a deposited film with light, a spectrometer 3 for spectrally diffracting the reflected light reflected by the substrate S, an optical multichannel analyzer 4 for detecting the spectrally diffracted light, and a computer 5 for computing the thickness of the thin film on the basis of the output of the analyzer 4. Further, the film thickness can be held constant by performing feedback control on the basis of the resultant measured value of the film thickness.
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