VACUUM FILM DEPOSITION SYSTEM

摘要

PROBLEM TO BE SOLVED: To provide a vacuum film deposition system capable of depositing a film having highly precise film thickness distribution and excellent in reproducibility. SOLUTION: The system is provided with: a base plate 10 having strength where the deformation due to difference between internal and external air pressures at evacuation becomes negligible; a chamber 11 disposed on the base plate via a sealing member 12 and constituting a vacuum chamber; a substrate holder 16 attached to the base plate 10 via a connecting member and holding a substrate 17 disposed within the vacuum chamber in a manner not to be mechanically constrained to the chamber; and film deposition sources 18 and 23 disposed within the vacuum chamber in a manner to be opposed to the substrate 17 and held parallel to the substrate 17 and attached to the base plate 10 via a sealing member 19.