SYNTHESIZED QUARTZ GLASS MEMBER FOR HIGH POWER ArF EXCIMER LASER AND MANUFACTURING METHOD THEREOF

摘要

PROBLEM TO BE SOLVED: To provide a synthesized quartz glass of high purity with a VAD method having a resistance to a high power ArF excimer laser resulting from a uniform distribution and a high concentration of OH group and H2 in itself, which originally exist in and are added to the synthesized quartz glass manufactured with a VAD method, focusing on the purity and the uniformity of the OH group and H2 though the concentration is low. SOLUTION: A synthesized quartz glass of high purity for a high power ArF excimer laser manufactured with a VAD method includes OH group of 500-1,500 ppm and H2 of 1×1017-1019 molecule/cm3 in itself.