发明名称 |
X-ray illumination device, x-ray illumination method, and an x-ray exposing device and device manufacturing method using the same |
摘要 |
An x-ray illumination device which illuminates an object by reflecting an x-ray irradiated from a SR emission point with at least one x-ray mirror comprises: first measuring means for measuring the position of the emission point; first control means for controlling the position of the emission point based on the measurements of the first measuring means; second measuring means for measuring the position of the x-ray near the x-ray mirror; and second control means for controlling the position or the attitude of the x-ray mirror based on the measurements of the second measuring means. The control frequency of the first control means of the x-ray illumination device here is of a frequency range higher than the control frequency of the second control means, and the ranges of the two control frequencies thereof partially overlap.
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申请公布号 |
US6256371(B1) |
申请公布日期 |
2001.07.03 |
申请号 |
US19980207023 |
申请日期 |
1998.12.08 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
HASEGAWA TAKAYUKI;WATANABE YUTAKA |
分类号 |
G21K1/06;G03F7/20;G21K5/02;H01L21/027;H05H13/04;(IPC1-7):H01L21/30 |
主分类号 |
G21K1/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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