METHOD OF MANUFACTURING ALUMINUM NITRIDE THIN FILM HAVING IMPROVED SURFACE AND BONDING CHARACTERISTIC

摘要

PROBLEM TO BE SOLVED: To provide a method of manufacturing an aluminum nitride thin film improved in surface flatness and chemical and electrical properties within a thin film even at low process temperatures by applying nitrogen plasma treatment to an aluminum nitride thin film. SOLUTION: In the method of treating the aluminum nitride thin film for the purpose of improving surface and bonding characteristics, microwave plasma treatment is carried out, after the vapor deposition of the aluminum nitride thin film, as a step of aftertreatment for the thin film.