| 摘要 |
PROBLEM TO BE SOLVED: To provide an ion machining apparatus to prevent extinction of plasma. SOLUTION: The ion machining apparatus comprises a chamber 1 to achieve the ion machining on a base material using a working material inside thereof, an electrode 2 of one polarity to which the base material disposed in the chamber 1 is loaded, a high frequency power source 3 to supply the high frequency power between the electrode 2 of one polarity and an electrode (1) of the other polarity so that plasma is generated in the chamber 1, a DC power source 4 to apply the bias voltage between the electrode 2 of one polarity and the electrode (1) of the other polarity so that the working material excited by plasma is directed to the base material, and an induction circuit element L2 which is interposed in a circuit to apply the bias voltage and has the inductance sufficient to substantially prevent the application of the high frequency power to the DC power source 4. |
