DEVICE FOR PASSING SUBSTRATES THROUGH A VAPOR DEPOSITION ZONE

摘要

A device for coating substrates in a vacuum plant comprising a vacuum chamber which is adapted to be subjected to reduced pressures and which includes at least one pair of laterally spaced sources for producing a deposition vapor current of the material to be coated in a deposition zone therebetween. A conveyor is movable through the chamber and through the deposition zone. A slider shield carrier extends over the conveyor and is supported thereon for movement through the deposition zone and provides a covering to shield the conveyor parts against the deposition of the material thereon. The substrates are supported preferably on each side of the slider shield carrier and they are moved with the carrier on the conveyor to expose them to the vapor deposition current.