| 摘要 |
A mirror projection system for use in a step-and-scan lithographic projection apparatus, in which a mask pattern is repetitively scan-imaged on a number of areas of a substrate by means of a beam of EUV radiation, and having a cross-section shaped as a segment of a ring, has six imaging mirrors. The design is such that an intermediate image is formed between the fourth and the firth mirror from the object side, and the system has a relatively large working distance.
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