发明名称 |
ROLLING BAR OF VERTICAL ETCHING SYSTEM |
摘要 |
PURPOSE: A rolling bar of a vertical etching bar is provided to improve the flatness of a wafer by forming a multitude of projection on an outer circumference of a rolling bar. CONSTITUTION: A rolling bar(30) supports and rotates a wafer to perform a uniform etching process. The rolling bar(30) is installed at an inside of a process box. An elastic member(32) is adhered to the rolling bar(30). The elastic member(32) prevents a flow of the fresh chemical to an edge of a wafer through an outer circumference of a cylindrical body(31). The elastic member(32) is installed to rotate smoothly the wafer. The elastic member(32) is formed with a multitude of projection. The projection has a fan shape.
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申请公布号 |
KR20010054294(A) |
申请公布日期 |
2001.07.02 |
申请号 |
KR19990055062 |
申请日期 |
1999.12.06 |
申请人 |
MEMC KOREA CO., LTD. |
发明人 |
JUNG, HA JIN;PARK, GAP SANG |
分类号 |
H01L21/306;(IPC1-7):H01L21/306 |
主分类号 |
H01L21/306 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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