发明名称 ROLLING BAR OF VERTICAL ETCHING SYSTEM
摘要 PURPOSE: A rolling bar of a vertical etching bar is provided to improve the flatness of a wafer by forming a multitude of projection on an outer circumference of a rolling bar. CONSTITUTION: A rolling bar(30) supports and rotates a wafer to perform a uniform etching process. The rolling bar(30) is installed at an inside of a process box. An elastic member(32) is adhered to the rolling bar(30). The elastic member(32) prevents a flow of the fresh chemical to an edge of a wafer through an outer circumference of a cylindrical body(31). The elastic member(32) is installed to rotate smoothly the wafer. The elastic member(32) is formed with a multitude of projection. The projection has a fan shape.
申请公布号 KR20010054294(A) 申请公布日期 2001.07.02
申请号 KR19990055062 申请日期 1999.12.06
申请人 MEMC KOREA CO., LTD. 发明人 JUNG, HA JIN;PARK, GAP SANG
分类号 H01L21/306;(IPC1-7):H01L21/306 主分类号 H01L21/306
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