| 摘要 |
PURPOSE: An apparatus for cleaning a wafer is provided to allow a cleaning of the wafer in a horizontal state without requiring any mechanical device converting the wafer to a vertical state. CONSTITUTION: The apparatus includes a cassette(10) in which the wafers are horizontally placed, a transferring robot(20) which conveys the wafers being kept in a horizontal position from the cassette(10) to a boat(50), the boat(50) which receives the wafers in a horizontal direction from the transferring robot(20), a boat-driving assembly(40) which vertically moves and rotates the boat(50), and a bath(30) which contains a cleaning fluid in which the boat(50) is immersed. The boat-driving assembly(40) has a driving shaft(42) connected to the boat(50), and two separate motors(41,43) for rotating and vertically moving the boat(50). The bath(30) has a plurality of jet orifices and outlets, which are formed on opposite sides of the bath(30) and produces streams of the cleaning fluid.
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