EXPOSURE APPARATUS WHICH CAN COMPENSATE LINE WIDTH DIFFERENCE BETWEEN LONGITUDINAL AND LATERAL PATTERNS AND APERTURE USED IN THEREOF

摘要

PURPOSE: An exposure apparatus and an aperture used in thereof are provided, which can compensate for a line width difference between a longitudinal and a lateral pattern. CONSTITUTION: An aperture(40) comprises a light-shielding area(IA) having a circular external form and a transparent area(TA) comprised in the light-shielding area. The transparent area is a non-circular transparent area whose eccentricity(e) is larger than 0 and smaller than 1. The transparent area has a major axis(42) connected to the thinnest part of the light-shielding area and a minor axis(44) connected to the thickest part of the light-shielding area and being orthogonal with the major axis. The major axis is about 56 mm long and the minor axis is about 42 mm long. There can be a circular aperture having various forms of transparent area according to the length of the major axis and the minor axis.