发明名称 METHOD FOR GROWING RUTILE SINGLE CRYSTAL
摘要 PROBLEM TO BE SOLVED: To grow a rutile single crystal free from crystal defect by changing the size of a seed crystal in the EGF process as one of the processes for growing rutile single crystals. SOLUTION: In a controlled furnace, a slit die 3 is installed in the starting melt 2 in a crucible 1 and the slit is used to allow the melt 2 to rise up to the upper face of the die 3 whereby a single crystal of the same shape as that of the slit die 3 is obtained and the single crystal is pulled up (the EFG process), the width of the slit die 3 is kept equal to that of the speed crystal whereby the objective single crystal 8 is obtained without crystal defect.
申请公布号 JP2001181091(A) 申请公布日期 2001.07.03
申请号 JP19990371457 申请日期 1999.12.27
申请人 NAMIKI PRECISION JEWEL CO LTD 发明人 FURUTAKI TOSHIRO;YAGUCHI YOICHI;SUNAKAWA KAZUHIKO;SATO TSUGIO;TOSHIMA HIROAKI;SASAKI TADASHI
分类号 C30B29/16;C30B15/34;G02B5/30;(IPC1-7):C30B29/16 主分类号 C30B29/16
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