发明名称 PLATING METHOD OF RECESSED HOLE
摘要 PROBLEM TO BE SOLVED: To provide a plating method of recessed holes which is stable in forming a uniform plating layer even for small holes and suitable for forming via holes in a multi-layer circuit substrate. SOLUTION: In forming a plating layer using a plating solution on an inner wall of a recessed hole 3A which is formed in a surface of a work A1 to be plated, 50-100μm in diameter, and 0.8-3.0 in the ratio of the hole diameter to the depth, the recessed hole is plated while continuously or intermittently blowing a jet 12a of the plating solution toward the recessed hole 3A from a jet nozzle 15.
申请公布号 JP2001181892(A) 申请公布日期 2001.07.03
申请号 JP19990362860 申请日期 1999.12.21
申请人 MEIKO:KK 发明人 KANDA TAKESHI;ISHIGURO SATOSHI
分类号 C25D7/00;C25D5/02;(IPC1-7):C25D7/00 主分类号 C25D7/00
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