METHOD OF FORMING COATING FILM, METHOD OF PRODUCING LIQUID CRYSTAL DEVICE AND FILM FORMING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a method of forming a coating film and a film forming device to form a film with high smoothness on a substrate while suppressing the cost for the film material. SOLUTION: A film forming device 100 is equipped with a turntable 107 to suck and hold a substrate 400 and with a nozzle 103 to supply a film material 109 in an atomized or liquid drop state onto the substrate 400. In the method of forming a coating film by using the film forming device 100, the film material 109 in an atomized or liquid drop state is supplied onto the substrate over almost the entire film forming region of the substrate 400 and then the turntable 107 is rotated so as to spread the film material supplied on the substrate to obtain a coating film having uniform film thickness.