发明名称 NEAR-FIELD LIGHT DEVICE AND ITS MANUFACTURE METHOD
摘要 PROBLEM TO BE SOLVED: To provide a near-field light device capable of irradiating with a near-field light having high intensity, and a method of manufacturing the same. SOLUTION: A near-field light device for irradiating with a near-field light and/or detecting it, comprises shading film 2, a recess 11 in the shape of inverse pyramid on the shading film 2, and a near-field light irradiation port 1 disposed on a tip of the recess 11 in the shape of the inverse pyramid with a size less than a wavelength of a light, and supporting bodies 3 for supporting the shading film 2. The thickness of the shading film 2 is of 10 to 5000 nm. The method of manufacturing the near-field light device is characterized in that a process of forming the near-field light irradiation port 11 includes a process of forming an impression on the shading film 2 by at least one or more indentators in the shape of inverse pyramid.
申请公布号 JP2001174393(A) 申请公布日期 2001.06.29
申请号 JP19990363008 申请日期 1999.12.21
申请人 SEIKO INSTRUMENTS INC 发明人 SATO KAZUO;SHIKIDA MITSUHIRO;ARAWA TAKASHI;KATO KENJI;MITSUOKA YASUYUKI;NAKAJIMA KUNIO
分类号 G11B7/12;G01B7/34;G01B21/30;G01Q60/22;G01Q80/00;G11B7/135 主分类号 G11B7/12
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