| 摘要 |
PROBLEM TO BE SOLVED: To provide a projection aligner and a method for manufacturing device, for readily realizing high optical performance, even when vacuum ultraviolet ray is used as the light source. SOLUTION: This projection aligner includes an illumination system for illuminating a reticle by the vacuum ultraviolet rays from a light source, and a projection optical system for projecting the image of the illuminated reticle pattern. At least a diffraction optical element is included in the whole optical system, and the diffraction optical element is formed on the substrate made of silica glass, containing trace of a substance. |
