发明名称 SEMICONDUCTOR WAFER AND HETERO BIPOLAR TRANSISTOR USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor wafer and a heterobipolar transistor, using the wafer capable of suppressing degradation of current gain and enhancing reliability, even when carrier concentration is enhanced in a sub-collector layer. SOLUTION: A sub-collector layer 31, a base layer 33 and emitter layers 34, 35 are formed on a substrate 30. Carbon (C) which is not less than 5×1017 cm-3 is added. Lowering of current gain can be eliminated, and reliability can be improved in GaAs HBT.
申请公布号 JP2001176880(A) 申请公布日期 2001.06.29
申请号 JP19990355173 申请日期 1999.12.14
申请人 HITACHI CABLE LTD 发明人 OTOGI YOHEI;MINAGAWA SHUNICHI;FUJIO SHINJIRO
分类号 H01L29/73;H01L21/331;H01L29/205;H01L29/737;(IPC1-7):H01L21/331 主分类号 H01L29/73
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