发明名称 |
METHOD AND APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To locate and adjust a potting nozzle precisely in a short time. SOLUTION: After a resin 8 is applied to an application face 1 from a nozzle 2 in potting equipment which seals a semiconductor element with a potting resin, the nozzle 2 is lowered further to make its tip sink into the resin 8 on the application face 7, thereby forming a recess 14, which reflects the shape of the tip of the nozzle 2. The position of the nozzle center 11 of the nozzle 2 is detected accurately with a camera image 15, on the basis of an image of the recess 14 in the resin 8.
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申请公布号 |
JP2001176897(A) |
申请公布日期 |
2001.06.29 |
申请号 |
JP19990355507 |
申请日期 |
1999.12.15 |
申请人 |
HITACHI LTD;HITACHI TOKYO ELECTRONICS CO LTD |
发明人 |
KATAYAMA YOSHIFUMI;FUJIMORI HIROYUKI;KURODA AKIRA;NADAMOTO KEISUKE;OZAWA KUNIAKI |
分类号 |
B05D3/00;B05C5/00;B05D7/00;G01B11/00;H01L21/56;(IPC1-7):H01L21/56 |
主分类号 |
B05D3/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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